Document Type
Patent
Publication Date
4-22-2003
Abstract
A tool and method for reloading source materials in a vapor phase deposition (VPD) environment is disclosed. They do not require the venting of the VPD environment in order to perform its functions. The tool may reload source material into effusion cells or electron beam cells of a molecular beam epitaxy machine without venting the growth chamber.
Department
Physics
Patent Number
US6551405
Application Filed
9-22-2000
Assignee
Board of Trustees of the University of Arkansas (Little Rock, AR)
Citation
Thibado, P. M., LaBella, V. P., & Bullock, D. W. (2003). Tool and method for in situ vapor phase deposition source material reloading and maintenance. Patents Granted. Retrieved from https://scholarworks.uark.edu/pat/148
COinS
Comments
Paul M. Thibado, Department of Physics, University of Arkansas, Fayetteville, AR
Vincent P. LaBella, Department of Physics, University of Arkansas, Fayetteville, AR
Daniel W. Bullock, Department of Physics, University of Arkansas, Fayetteville, AR