Document Type

Patent

Publication Date

4-22-2003

Abstract

A tool and method for reloading source materials in a vapor phase deposition (VPD) environment is disclosed. They do not require the venting of the VPD environment in order to perform its functions. The tool may reload source material into effusion cells or electron beam cells of a molecular beam epitaxy machine without venting the growth chamber.

Department

Physics

Patent Number

US6551405

Application Filed

9-22-2000

Assignee

Board of Trustees of the University of Arkansas (Little Rock, AR)

Comments

Paul M. Thibado, Department of Physics; Vincent P. LaBella, Department of Physics; Daniel W. Bullock, Department of Physics

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