Disclosed are polished and planarized diamond films and a method and apparatus for polishing and planarizing diamond films. The method generally includes mechanical polishing of the diamond film against a ceramic surface in the presence of a treating agent of potassium nitrate and a polishing agent of potassium hydroxide. The produced films have an average surface roughness on the order of 0.05 microns, a planarization uniformity within eight percent, and are relatively free of process-induced contaminants.
Electrical Engineering; Mechanical Engineering
Board of Trustees of the University of Arkansas (Little Rock, AR)
Malshe, Ajay P.; Naseem, Hameed A.; and Brown, William D., "Apparatus for and method of polishing and planarizing polycrystalline diamonds, and polished and planarized polycrystalline diamonds and products made therefrom" (1998). Patents Granted. 203.