Document Type

Patent

Publication Date

3-10-1998

Abstract

Disclosed are polished and planarized diamond films and a method and apparatus for polishing and planarizing diamond films. The method generally includes mechanical polishing of the diamond film against a ceramic surface in the presence of a treating agent of potassium nitrate and a polishing agent of potassium hydroxide. The produced films have an average surface roughness on the order of 0.05 microns, a planarization uniformity within eight percent, and are relatively free of process-induced contaminants.

Department

Electrical Engineering; Mechanical Engineering

Patent Number

US5725413

Application Filed

5-6-1994

Assignee

Board of Trustees of the University of Arkansas (Little Rock, AR)

Comments

Ajay P. Malshe, Department of Mechanical Engineering; Hameed A. Naseem, Department of Electrical Engineering; William D. Brown, Department of Electrical Engineering

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