Asynchronous and synchronous designs for low-power FDSOI CMOS process optimized for subthreshold operation at 0.3V VDD
Document Type
Article - Abstract Only
Publication Date
2015
Keywords
Finite impulse response filters, Ring oscillators, Energy consumption, Power demand, Transistors, Measurement, Switching circuits, asynchronous circuits, circuit optimisation, CMOS digital integrated circuits, integrated circuit design, integrated circuit reliability, low-power electronics, silicon-on-insulator, synchronous ring oscillator, synchronous FIR filter, homogeneous parallel asynchronous platform, transistor technology optimization, MIT Lincoln Lab, digital circuits, supply threshold voltage scaling, CMOS IC reliability, heat generation, power consumption, subthreshold operation optimization, low-power FDSOI CMOS process, synchronous designs, asynchronous designs, voltage 0.3 V, size 90 nm, Si, subthreshold operation, FDSOI, asynchronous logic, low power
Abstract
Power consumption and heat generation in CMOS-based ICs are the dominating factors affecting the system's performance and reliability. Many power reduction techniques, e.g., supply voltage scaling, implementing smaller transistors, limiting switching activity, are well known in public. Supply and threshold voltage scaling is among one of the most efficient methods for reducing power. In addition, process technology designed with transistors optimized for subthreshold operation is a more fundamental path to conserve the low power characteristic of the system. To demonstrate the significance of the process, a series of digital circuits were fabricated using MIT Lincoln Lab's 90nm XLP FDSOI CMOS process with novel transistor technology optimized for 300 mV supply voltage. The circuits include synchronous ring oscillator, synchronous FIR filter, asynchronous ring oscillator, asynchronous FIR filter, and homogeneous parallel asynchronous platform.
Citation
C. Lo, L. Men, J. Brady and J. Di, "Asynchronous and synchronous designs for low-power FDSOI CMOS process optimized for subthreshold operation at 0.3V VDD," 2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), Rohnert Park, CA, 2015, pp. 1-3. doi: 10.1109/S3S.2015.7333511
Comments
Principal Investigator: Jia Di