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Abstract

Thallination techniques used for the fabrication of sputter-deposited TI2Ba2CaCu 2Ox and TI2Ba2Ca2Cu3Ox superconducting thin films were investigated. Differences in elemental composition of precursor Ba-Ca-Cu-O sputtering targets were found to yield different superconducting phases. Thallination conditions which yielded transition temperatures as high as 122 K for samples annealed in air are described. Finally, reactive ion etching of films using a mixture of chlorine and argon gases is discussed.

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