Titanium Aluminum Nitride Films Deposited by AC Reactive Magnetron Sputtering: Study of Positioning Effect in an Inverted Cylindrical Magentron Sputtering System
Date of Graduation
Master of Science in Microelectronics-Photonics (MS)
Matthew H. Gordon
Second Committee Member
Applied sciences, Material characterization, Thin film deposition
TiAlN films were deposited on glass substrates by AC magnetron sputtering at 2 kW with constant Argon and Nitrogen gas flow rates to study the effects of positioning on the deposited films. The deposition system used was an ICM-10 IsoFlux cylindrical magnetron sputtering chamber. The samples were placed in different positions and tilts with respect to the location of the Titanium and Aluminum targets in the chamber. It was found that with change in position and application of tilts, deposited films acquired different physical and chemical properties. It is believed that the differences in these properties were caused by to the change in the incident angle of bombardment of the samples, and the change in surface areas of the samples presented to the targets at each location. As related to the physical traits of the samples, analysis using Scanning Electron Microscopy of the samples displayed variations in the topography, where differences in grain density could be noted as well as structure formations. The chemical properties were also noted to be affected by the variation of tilt and position applied to the sample. X-ray Diffraction Spectroscopy analysis of the samples showed the intensity of the TiAlN characteristic peak of the samples to differ from sample to sample. Results from the XRD analysis of this work showed a 157% and 176% increase in peak intensity of the 0¡Æ tilt sample of the Bottom Plate from the 45¡Æ tilt sample and 60¡Æ tilt sample respectively of the same plate. The results from the XRD analysis of this work also showed a 74% and 151% increase of the peak intensity for the 0¡Æ tilt sample of the Middle Plate when compared to the 45¡Æ tilt sample and 60¡Æ tilt sample respectively of the same plate. Whereas results for this work showed a 54% and 41% decrease in peak intensity of the 0¡Æ tilt sample of the Top Plate from the 45¡Æ tilt sample and 60¡Æ tilt sample respectively of the same plate. Energy Dispersive X-ray Spectroscopy was also performed and showed the deposited elements in each sample. A relationship between the distance from sample to target, and applied tilt of sample to the amount of Ti concentration was generated using the peak intensity information from the EDX. EDX analysis showed that as tilt was applied and the incident angle of bombardment approaches 0¢ª the Ti concentration increased.
Vandross, G. C. (2012). Titanium Aluminum Nitride Films Deposited by AC Reactive Magnetron Sputtering: Study of Positioning Effect in an Inverted Cylindrical Magentron Sputtering System. Graduate Theses and Dissertations Retrieved from https://scholarworks.uark.edu/etd/613