A tool and method for reloading source materials in a vapor phase deposition (VPD) environment is disclosed. They do not require the venting of the VPD environment in order to perform its functions. The tool may reload source material into effusion cells or electron beam cells of a molecular beam epitaxy machine without venting the growth chamber.
Board of Trustees of the University of Arkansas (Little Rock, AR)
Thibado, P. M., LaBella, V. P., & Bullock, D. W. (2003). Tool and method for in situ vapor phase deposition source material reloading and maintenance. Patents Granted. Retrieved from https://scholarworks.uark.edu/pat/148