A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0 eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.
Chemistry & Biochemistry
US 20200370193 A1
Board of Trustees of the University of Arkansas (Fayetteville, AR)
Coridan, R. H., & Lowe, J. M. (2022). Light-directed electrochemical patterning of copper structures. Patents Granted. Retrieved from https://scholarworks.uark.edu/pat/431