Document Type

Patent

Publication Date

8-1-2017

Abstract

A process for fabricating a nanochannel system using a combination of microelectromechanical system (MEMS) microfabrication techniques, atomic force microscopy (AFM) nanolithography, and focused ion beam (FIB). The nanochannel system, fabricated on either a glass or silicon substrate, has channel heights and widths on the order of single to tens of nanometers. The channel length is in the micrometer range. The nanochannel system is equipped with embedded micro and nanoscale electrodes, positioned along the length of the nanochannel for electron tunneling based characterization of nanoscale particles in the channel. Anodic bonding is used to cap off the nanochannel with a cover chip.

Department

Biological and Agricultural Engineering; Mechanical Engineering

Patent Number

US9718668

Application Number

US 20170152134 A9

Application Published

6-1-2017

Application Filed

7-26-2013

Assignee

Board of Trustees of the University of Arkansas (Little Rock, AR)

Comments

Chao-Hung Steve Tung, Department of Mechanical Engineering, University of Arkansas, Fayetteville, AR
Jin-Woo Kim, Biological and Agricultural Engineering, University of Arkansas, Fayetteville, AR

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