Date of Graduation

8-2007

Document Type

Thesis

Degree Name

Bachelor of Science in Mechanical Engineering

Degree Level

Undergraduate

Department

Mechanical Engineering

Advisor/Mentor

Gordon, Matthew H.

Abstract

In this report, we will investigate Langmuir probe and mass spectrometer plasma diagnostic systems used to characterize conditions within a magnetron sputtering system. The specific systems used were the ESPION Langmuir probe and EQP mass spectrometer by Hiden Analytical and the ICM-10 inverted cylindrical magnetron sputtering system by Isoflux, Inc. This paper will show how these systems work, are operated, and produce data. Low power oxygen and argon plasmas were used through this research for diagnostics. With the EQP, two modes were used to collect data: RGA for neutrals and radicals and SIMS for positive ions. With both modes, mass and energy scans were produced. With the ESPION, current vs. voltage (I-V), first differential, second differential, and electron energy distribution functions (EEDF) were created. Also I-V curves at different locations within our sputtering system were made and compared. This preliminary research will help to lay the ground work for others to produce a true characterization of our system and so that in the future correlations can be made between the plasma conditions present and the quality of the films deposited.

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Engineering Commons

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