Non-Covalent Functionalization of Graphene Films for Uniform Nanoparticle Deposition via Atoic Layer Deposition

Author

Ty Seiwert, University of Arkansas, FayettevilleFollow

Date of Graduation

5-2018

Document Type

Thesis

Degree Name

Bachelor of Science in Mechanical Engineering

Degree Level

Undergraduate

Department

Mechanical Engineering

Advisor/Mentor

Wejinya, Uchechukwu C.

Committee Member

Meng, Xiangbo

Second Committee Member

Roe, Larry A.

Abstract

Graphene functionalized with platinum (Pt) and palladium (Pd) has proven to be highly effective as a hydrogen sensor. Deposition methods such as Atomic layer deposition (ALD) can be further enhanced by pretreating the graphene with a non-covalent surfactant prior to nanoparticle deposition. In this study, graphene-based sensing devices will be fabricated by ALD deposition. The graphene will be non-covalently functionalized using sodium dodecyl sulfate (SDS) anionic surfactant prior to ALD deposition. The aim of this study is to test the deposition pattern achieved by varying the amount of time that graphene is treated with the SDS surfactant. Initially, ALD deposition of Zinc-Oxide (ZnO) will be performed and the resulting patterns will be analyzed using SEM imagining. The resulting patterns will then be used to aid in the deposition of Pt and Pd onto graphene using ALD in future work.

Citation

Seiwert, T. (2018). Non-Covalent Functionalization of Graphene Films for Uniform Nanoparticle Deposition via Atoic Layer Deposition. Mechanical Engineering Undergraduate Honors Theses Retrieved from https://scholarworks.uark.edu/meeguht/71