Document Type
Article
Publication Date
5-2022
Keywords
graphene; photolithography; wet etching; variable capacitor; atomic force microscopy; critical point drying; graphene transfer; integrated circuit
Abstract
Highly flexible, electrically conductive freestanding graphene membranes hold great promise for vibration-based applications. This study focuses on their integration into mainstream semiconductor manufacturing methods. We designed a two-mask lithography process that creates an array of freestanding graphene-based variable capacitors on 100 mm silicon wafers. The first mask forms long trenches terminated by square wells featuring cone-shaped tips at their centers. The second mask fabricates metal traces from each tip to its contact pad along the trench and a second contact pad opposite the square well. A graphene membrane is then suspended over the square well to form a variable capacitor. The same capacitor structures were also built on 5 mm by 5 mm bare dies containing an integrated circuit underneath. We used atomic force microscopy, optical microscopy, and capacitance measurements in time to characterize the samples.
Citation
Gikunda, M. N., Harerimana, F., Mangum, J. M., Rahman, S., Thompson, J. P., Harris, C. T., Churchill, H. O., & Thibado, P. M. (2022). Array of Graphene Variable Capacitors on 100 mm Silicon Wafers for Vibration-Based Applications. Membranes, 12 (5), 533. https://doi.org/10.3390/membranes12050533
Creative Commons License
This work is licensed under a Creative Commons Attribution 4.0 International License.
